Supplementary Data for: Optimization of grayscale lithography for the fabrication of Flat Diffractive Infrared Lenses on Silicon Wafershttps://doi.org/10.23642/USN.26130904Bouchouri AngelosDataverseNO2024-07-032025-12-22T12:47:57ZDATASET MIGRATED FROM FIGSHARE: <p dir="ltr">Images and data acquired during the experiment and presented in the article.</p>Othergrayscale lithographyinfrared imaging systemsfresnel lensesreactive ion etching conditionsOptimization of Grayscale Lithography for the Fabrication of Flat Diffractive Infrared Lenses on Silicon Wafers, doi, 10.3390/mi15070866, https://doi.org/10.3390/mi150708662024-07-03University of South-Eastern Norway2024-07-03CC BY 4.0